We present the progress of a high-performance inertial sensor manufacturing processes implemented in a volume compatible 200mm wafer diameter production environment. The baseline process, derived from Teledyne DALSA's MIDIS™ process platform, incorporates critical design elements specifically designed for navigation-grade device realization. The process enables considerable flexibility to support a broad range of device designs, facilitating the rapid transition of new device concepts to volume production. The recent work for the Si Disc Resonator Gyro (SiDRG) demonstrates the integration of die-level thermal stabilization elements and the manufacturing at high yield of wafer-level vacuum packaged gyro resonators with high quality factor and small frequency splits. Initial measurement of Allen Deviation on unscreened parts has shown promising performance levels of 0.028 degrees/hour.
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机译:我们介绍了在体积兼容的200mm晶圆直径生产环境中实施的高性能惯性传感器制造工艺的进展。基线处理源自Teledyne DALSA的MIDIS™处理平台,结合了专门为导航级设备实现而设计的关键设计元素。该过程提供了相当大的灵活性以支持广泛的设备设计,从而促进了新设备概念向批量生产的快速过渡。 Si Disc谐振器陀螺仪(SiDRG)的最新工作证明了芯片级热稳定元件的集成以及晶片级真空封装陀螺仪谐振器的高产量制造,其品质因数高且频率分割小。最初对未筛查零件的艾伦偏差的测量显示出有希望的0.028度/小时的性能水平。
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