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Drain Current Local Variability from Linear to Saturation Region in 28nm bulk NMOSFETs

机译:在28nm散装NMOSFET中排出从线性到饱和区的电流局部可变性

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In this work the impact of the source - drain series resistance mismatch on the drain current variability has been investigated for 28nm Bulk MOSFETs. For the first time a mismatch model including the local fluctuations of the threshold voltage, the current gain factor and the source - drain series resistance both in linear and saturation region is presented. Furthermore, it is proved that the influence of source - drain series resistance mismatch is attenuated at the saturation region, due to lower drain current sensitivity to series resistance variation. The experimental results were further verified by Monte Carlo simulation with normally distributed MOSFET parameters.
机译:在这项工作中,对28nm散装MOSFET进行了研究了源极 - 漏极串联电阻不匹配的影响。对于第一次不匹配模型,包括阈值电压的局部波动,提出了线性和饱和区域中的电流增益因子和源极漏极串联电阻。此外,证明了源极 - 漏极串联电阻不匹配的影响在饱和区域上衰减,由于串联电流敏感性较低的串联电阻变化。通过具有正常分布的MOSFET参数的Monte Carlo模拟进一步验证了实验结果。

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