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Drain current local variability from linear to saturation region in 28 nm bulk NMOSFETs

机译:28 nm体NMOSFET中漏极电流从线性到饱和区域的局部变化

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摘要

In this work, we investigate the impact of the source - drain series resistance mismatch on the drain current variability in 28 nm bulk MOSFETs. For the first time, a mismatch model including the local fluctuations of the threshold voltage (V-t), the drain current gain factor (beta) and the source - drain series resistance (R-SD) in both linear and saturation regions is presented. Furthermore, it is demonstrated that the influence of the source - drain series resistance mismatch is attenuated in the saturation region, due to the weaker sensitivity of the drain current variability on the series resistance variation. The experimental results were further verified by numerical simulations of the drain current characteristics with sensitivity analysis of the MOSFET parameters V-t, beta and R-50. (C) 2016 Elsevier Ltd. All rights reserved.
机译:在这项工作中,我们研究了28 nm体MOSFET中源漏串联电阻失配对漏电流可变性的影响。首次提出了一种不匹配模型,该模型包括线性和饱和区域中的阈值电压(V-t),漏极电流增益因子(β)和源极-漏极串联电阻(R-SD)的局部波动。此外,已经证明,由于漏极电流可变性对串联电阻变化的敏感性较弱,因此在饱和区中源-漏串联电阻失配的影响被减弱。通过对MOSFET参数V-t,β和R-50进行灵敏度分析,通过漏电流特性的数值模拟进一步验证了实验结果。 (C)2016 Elsevier Ltd.保留所有权利。

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