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Self-heating effect in FinFETs and its impact on devices reliability characterization

机译:FinFET中的自热效应及其对器件可靠性表征的影响

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The impact of self-heating effect (SHE) on device reliability characterization, such as BTI, HCI, and TDDB, is extensively examined in this work. Self-heating effect and its impact on device level reliability mechanisms is carefully studied, and an empirical model for layout dependent SHE is established. Since the recovery effect during NBTI characterization is found sensitive to self-heating, either changing VT shift as index or adopting μs-delay measurement system is proposed to get rid of SHE influence. In common HCI stress condition, the high drain stress bias usually leads to high power or self-heating, which may dramatically under-estimate the lifetime extracted. The stress condition Vg = 0.6∼0.8Vd is suggested to meet the reasonable operation power and self-heating induced temperature rising. Similarly, drain-bias dependent TDDB characteristics are also under-estimated due to the existence of SHE and need careful calibration to project the lifetime at common usage bias.
机译:在这项工作中,广泛研究了自热效应(SHE)对器件可靠性特性(例如BTI,HCI和TDDB)的影响。仔细研究了自热效应及其对器件级可靠性机制的影响,并建立了与布局有关的SHE的经验模型。由于发现NBTI表征过程中的恢复效应对自热敏感,因此建议改变VT位移作为指标或采用μs延迟测量系统来消除SHE影响。在常见的HCI应力条件下,较高的漏极应力偏置通常会导致高功率或自发热,这可能会大大低估提取的寿命。建议应力条件Vg = 0.6〜0.8Vd,以满足合理的工作功率和自热引起的温升。同样,由于存在SHE,依赖于漏极偏置的TDDB特性也被低估了,因此需要仔细校准以预测常见使用偏差下的寿命。

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