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Self-heating effect in FinFETs and its impact on devices reliability characterization

机译:FinFET中的自热效果及其对设备可靠性表征的影响

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The impact of self-heating effect (SHE) on device reliability characterization, such as BTI, HCI, and TDDB, is extensively examined in this work. Self-heating effect and its impact on device level reliability mechanisms is carefully studied, and an empirical model for layout dependent SHE is established. Since the recovery effect during NBTI characterization is found sensitive to self-heating, either changing VT shift as index or adopting μs-delay measurement system is proposed to get rid of SHE influence. In common HCI stress condition, the high drain stress bias usually leads to high power or self-heating, which may dramatically under-estimate the lifetime extracted. The stress condition Vg = 0.6∼0.8Vd is suggested to meet the reasonable operation power and self-heating induced temperature rising. Similarly, drain-bias dependent TDDB characteristics are also under-estimated due to the existence of SHE and need careful calibration to project the lifetime at common usage bias.
机译:自热效应(SHE)对设备可靠性表征的影响,例如BTI,HCI和TDDB,在这项工作中被广泛检查。仔细研究了自热效果及其对设备级可靠性机制的影响,建立了她的布局依赖的实证模型。由于NBTI表征期间的恢复效果被发现对自加热敏感,因此提出了随着索引或采用μs延迟测量系统的改变VT变换,以摆脱她的影响。在常见的HCI应力条件下,高漏极应力偏压通常导致高功率或自加热,这可能会显着估计提取的寿命。建议应力条件Vg = 0.6〜0.8VD以满足合理的运行功率和自加热诱导温度上升。类似地,由于她的存在并且需要仔细校准以在普通使用偏差下投影寿命而估计漏极偏置的TDDB特性。

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