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Neutron-induced single-event-transient effects in ultrathin-body fully-depleted silicon-on-insulator MOSFETs

机译:中子诱发的超薄全耗尽绝缘体上硅MOSFET中的单事件瞬态效应

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The neutron-induced single-event-transient (SET) response of 22-nm technology ultrathin-body fully-depleted silicon-on-insulator transistors is examined. Simulation results show that the impacts of ground plane doping and quantum effects on SETs are relatively small. The SET characteristics and collected charge are strike-location sensitive. The most SET-sensitive region in ultrathin-body fully-depleted SOI transistors is located near the drain region. The transient current peak is strongly affected by substrate bias. In contrast, the total collected charge depends only weakly on substrate bias. Circuits that are sensitive to total collected charge (e.g., SRAMs) may not be influenced by substrate bias, but substrate bias will impact the SET sensitivity of combinational logic.
机译:研究了22纳米技术的超薄型全耗尽绝缘体上硅晶体管的中子感应单事件瞬态(SET)响应。仿真结果表明,地平面掺杂和量子效应对SET的影响相对较小。 SET特性和收集的电荷对打击位置敏感。超薄型全耗尽SOI晶体管中对SET最敏感的区域位于漏极区域附近。瞬态电流峰值受衬底偏置的强烈影响。相反,收集到的总电荷仅微弱地取决于衬底偏压。对总收集电荷敏感的电路(例如SRAM)可能不受衬底偏置的影响,但是衬底偏置会影响组合逻辑的SET灵敏度。

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