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Development of InAlN/GaN HEMTs Power Devices in S-Band

机译:S波段InAlN / GaN HEMT功率器件的开发

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We report on AlInN/GaN HEMTs fabricated using 0.7µm gate length on SiC substrate by Low Pressure Metal Organic Vapor Phase Epitaxy. Static and pulsed DC characteristics show a maximum dc transconductance of 275mS/mm and drain current of 0.9A/mm. Small signal characterizations show Ft and Fmag of 15 and 40 GHz respectively. Load-pull power measurements were performed at S-Band. At 3.5 GHz, an output power of 13W (41.2dBm) corresponding to 6.6W/mm of power density with a PAE of 70% is reached in pulse mode on 2mm devices. 19.2mm power dies allow us to achieve an output power of 56W with 54% of PAE at 2 GHz. To our knowledge, this result represents the highest output power ever reported for AlInN-based HEMT technology.
机译:我们报告了通过低压金属有机气相外延在SiC衬底上使用0.7µm栅长制造的AlInN / GaN HEMT。静态和脉冲直流特性显示最大直流跨导为275mS / mm,漏极电流为0.9A / mm。小信号表征分别显示出15 GHz和40 GHz的Ft和Fmag。负载牵引功率测量在S波段进行。在3.5 GHz频率下,在2mm器件上以脉冲模式可以达到13W(41.2dBm)的输出功率,对应于6.6W / mm的功率密度和70%的PAE。 19.2mm的功率管芯使我们在2 GHz时可实现56W的输出功率和54%的PAE。据我们所知,此结果代表了基于AlInN的HEMT技术所报告的最高输出功率。

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