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Growth of 2H-SiC Single Crystals in a C-Li-Si Ternary Melt System

机译:C-Li-Si三元熔体体系中2H-SiC单晶的生长

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We have achieved the first successful growth of 2H-SiC single crystals using the C-Li-Si melt system. Li-Si melt, whose melting point is lower than 1000 °C, was chosen because the 2H-SiC polytype is more stable at lower temperatures than other polytypes such as 3C-, 4H-, and 6H-SiC. Many hexagonal-shaped crystals of approximately 100 μm in diameter were observed via a scanning electron microscope (SEM). A high resolution transmission electron microscope (HR-TEM) lattice image of the grown crystals showed a periodical structure with A-B stacking along the <0001> direction. These results indicated that the Li-based flux was useful for growing bulk 2H-SiC single crystals.
机译:我们使用C-Li-Si Melt系统实现了2H-SiC单晶的第一次成功生长。选择熔点低于1000℃的Li-Si熔体,因为2H-SiC PolyType在较低温度下比其他多型更稳定,例如3C-,4H-和6H-SiC。通过扫描电子显微镜(SEM)观察到直径约100μm的许多六边形晶体。生长晶体的高分辨率透射电子显微镜(HR-TEM)晶格图像显示了沿+ 001的A-B堆叠的周期性结构。这些结果表明,锂基通量可用于种植鳞片2H-SiC单晶。

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