首页> 外国专利> Single crystal melt level regulation apparatus, single crystal growth apparatus including the regulation apparatus, and single crystal melt level regulation method

Single crystal melt level regulation apparatus, single crystal growth apparatus including the regulation apparatus, and single crystal melt level regulation method

机译:单晶熔体液位调节装置,包括该调节装置的单晶生长装置和单晶熔体液位调节方法

摘要

single crystals melt level control, level control crystal growth apparatus and method for single-crystal melt having the same are disclosed. A single crystal growing apparatus according to the present invention is a train Majesty ingot of silicon single crystal growth chamber, and the single crystal in the crystal growth chamber for growing a silicon single crystal ingot is detected, and the temperature of the heat shield, the single crystal melt level based on the temperature of the heat shield and a single crystal control unit for controlling the melt level. And the single crystal melt level control device according to the invention is a single crystal growth chamber of a silicon single crystal ingot in the train the sire is a temperature sensing means for sensing the temperature of the heat shield, the lower end of the heat shield on the basis of the temperature of the silicon melt and the heat shield comprises the spacing of the melt gap calculation means for calculating a gap value of the melt, and the melt gap control means for controlling the elevation of the crucible for accommodating a silicon melt in accordance with the melt-receiving gap value from the value calculation means provides a gap between the surface of the melt. According to the present invention as described above, so obtaining a single crystal growth apparatus accurately control the distance between the heat shield and the surface of the melt in the single crystal growing apparatus, and enables a stable crystal growth, the need for operator to manually control the single crystal growth apparatus disappear.
机译:公开了单晶熔体液位控制,液位控制晶体生长设备以及具有该设备的单晶熔体方法。根据本发明的单晶生长设备是单晶硅单晶生长室的Ma下晶锭,并且检测用于生长单晶硅晶锭的晶体生长室中的单晶,并且热屏蔽罩的温度,基于隔热板温度的单晶熔体液位和用于控制熔体液位的单晶控制单元。并且根据本发明的单晶熔体液位控制装置是列车中的硅单晶锭的单晶生长室,其父亲是用于感测隔热板的温度的温度感测装置,隔热板的下端。基于硅熔体的温度和隔热罩,包括:熔体间隙计算装置的间隔,用于计算熔体的间隙值;以及熔体间隙控制装置,用于控制用于容纳硅熔体的坩埚的高度根据来自数值计算装置的熔体接收间隙值,在熔体表面之间提供间隙。根据如上所述的本发明,因此获得一种单晶生长设备,从而在单晶生长设备中精确地控制隔热板与熔体表面之间的距离,并且能够实现稳定的晶体生长,操作者需要手动进行操作。控制单晶生长装置消失。

著录项

  • 公开/公告号KR101028933B1

    专利类型

  • 公开/公告日2011-04-12

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20090005329

  • 发明设计人 안윤하;하세근;

    申请日2009-01-22

  • 分类号C30B15/20;G01K7/00;

  • 国家 KR

  • 入库时间 2022-08-21 17:50:20

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