Die/wafer stacking with reciprocal design symmetry (RDS) for mask reuse in three-dimensional (3D) integration technology

摘要

Each stratum in a 3D chip usually requires a unique mask set which increases the mask cost for a multi-strata chip compared to its 2D counterpart. We present a novel design technique using reciprocal design symmetry (RDS) that allows a mask set (or at least a majority of these) to be used for different strata while still achieving vertical placement and connection of different design functionalities. We demonstrate an application of RDS using a detailed example of a 3D dual-core microprocessor with analyses of various design complexity and testability issues, and a comprehensive simulation and comparison of its thermal characteristics. The coarse grained partitioning of selfcontained functional units achieved with RDS is suitable for early adoption of 3D technology as well as for long-term application to low cost system integration due to less redesign effort, design tool requirements, and better testability of each stratum before and after bonding.