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Tensile and Compressive stress dependency of the transverse (e31,f) piezoelectric coefficient of PZT thin films for MEMS devices

机译:MEMS器件PZT薄膜的横向(e31,f)压电系数的拉伸和压缩应力依赖性

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Two measurement methods are presented to determine precisely and reliable the electrical and electromechanical response of piezoelectric thin film structures. A double beam laser interferometer (DBLI) was used to measure large signal polarization, displacement, dielectric constant and the effective longitudinal piezoelectric coefficient d_(33,f) in out of plane direction of the film. Secondly, a unique and newly developed measurement setup based on a 4-point bending sample holder for cantilever devices was used to determine the transverse effective piezoelectric coefficient e_(31,f). This setup allows the application of precisely defined and homogeneous in plain mechanical strains to the piezoelectric film. The homogeneous stress and strain distributions were proved by Finite Element Simulations. Additional measurements have been performed to investigate the influence of in plane mechanical preloads on the transverse coefficient. Measurements are shown on Pb(Zr_(53),Ti_(47))O_3 (PZT) thin film samples deposited by a sol-gel based chemical solution deposition process which was optimized to maximize the e_(31,f) coefficient. Exceptional high e_(31,f) coefficients demonstrate the quality of the processed films.
机译:提出了两种测量方法,可以精确,可靠地确定压电薄膜结构的电气和机电响应。使用双光束激光干涉仪(DBLI)来测量薄膜平面外的大信号极化,位移,介电常数和有效纵向压电系数d_(33,f)。其次,基于悬臂装置的四点弯曲样品架的独特而新开发的测量装置用于确定横向有效压电系数e_(31,f)。这种设置允许在压电薄膜上施加精确定义且均匀的普通机械应变。通过有限元模拟证明了均匀应力和应变分布。已经进行了其他测量,以研究平面内机械预紧力对横向系数的影响。测量结果显示在通过基于溶胶-凝胶的化学溶液沉积工艺沉积的Pb(Zr_(53),Ti_(47))O_3(PZT)薄膜样品上,该膜工艺已优化以最大化e_(31,f)系数。极高的e_(31,f)系数证明了加工过的薄膜的质量。

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