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首页> 外文期刊>Sensors and Actuators, A. Physical >The wafer flexure technique for the determination of the transverse piezoelectric coefficient (d(31)) of PZT thin films
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The wafer flexure technique for the determination of the transverse piezoelectric coefficient (d(31)) of PZT thin films

机译:晶片弯曲技术用于测定PZT薄膜的横向压电系数(d(31))

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摘要

This paper describes a simple and inexpensive method for evaluating the transverse piezoelectric coefficient (d(31)) of piezoelectric thin films. The technique is based upon the flexure of a coated substrate which imparts an ac two-dimensional stress to the piezoelectric film. The surface charge generated via the mechanical loading is converted to a voltage by an active integrator. Plate theory and elastic stress analyses are used to calculate the principal stresses applied to the film. The d(31) coefficient can then be determined from knowledge of the electric charge produced and the calculated mechanical stress. For 52/48 sol-gel lead zirconate titanate (PZT) thin films, the d(31) coefficient was found to range from -5 to -59 pC/N and is dependent on poling field. (C) 1998 Elsevier Science S.A. All rights reserved. [References: 20]
机译:本文介绍了一种简单而便宜的方法来评估压电薄膜的横向压电系数(d(31))。该技术基于涂覆的基板的挠曲,该挠曲的基板向压电膜施加了交流二维应力。通过机械负载产生的表面电荷通过有源积分器转换为电压。使用板理论和弹性应力分析来计算施加到薄膜上的主应力。然后可以从所产生的电荷和所计算的机械应力的知识中确定d(31)系数。对于52/48溶胶-凝胶钛酸锆钛酸铅(PZT)薄膜,d(31)系数的范围为-5至-59 pC / N,并取决于极化场。 (C)1998 Elsevier Science S.A.保留所有权利。 [参考:20]

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