Progressions in deep ultraviolet bottom antireflective coatings

摘要

Deep ultraviolet (DUV) bottom anti-reflective coating (BARC)-to-resist compatibility is a key component in process optimization. In addition to the reduction of optical interference effects. BARC's also improve CD uniformity by preventing substrate contamination. However, if the BARC is not compatible with the resist, it can create adverse affects. If the acidity l evel of the BARC is not tuned to the resist for example, the profiles will foot or undercut, or if the BARC-to-resist developer interactions are not considered, high levels of post-develop defects will most likely occur. Etch selectivity, topography conformality and bowl/drain compatibility are other factors to consider when selecting a BARC. This paper follows the progressions of the leading DUV BARC's for Acetal-based resist systems and addresses the problems that could be encountered with implementing a BARC process. From DUV32 to the topography-conforming DUV42 and finally to the prfofile-enhancing DUV44, the 248 nm BARC's are BARC's are continually evolving to resolve the BARC-to-resist compatibility issues.