首页> 外文会议>Electronic Materials and Packaging, 2000. (EMAP 2000). International Symposium on >Feasibility and reliability study on the electroless nickel bumping and stencil solder printing for low-cost flip chip electronic packaging
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Feasibility and reliability study on the electroless nickel bumping and stencil solder printing for low-cost flip chip electronic packaging

机译:低成本倒装芯片电子封装的化学镀镍凸点和模板焊料印刷的可行性和可靠性研究

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We present a study on the feasibility and reliability of a low-cost flip chip technology using a combination of electroless nickel bumping and stencil solder printing. Circular aluminum bump pads of diameter 250 /spl mu/m and pitch 400 /spl mu/m with 200 /spl mu/m openings in the passivation layer were patterned for the study. Since it has been suggested that phosphorus from the electroless nickel solution will degrade the adhesion of solder, three types of electroless nickel deposits were prepared as the under bump metallurgy (UBM) consisting of electroless nickel-high phosphorous (EN-HP), electroless nickel-low phosphorous (EN-LP) and electroless nickel-boron (EN-B). Eutectic lead-tin solder paste of composition 63Sn-37Pb was screen-printed on the electroless nickel UBM followed by reflow at a peak temperature of 230/spl deg/C. The final solder bump height achieved was 155/spl plusmn/8 /spl mu/m. The shearing strength was found to decrease in the order of EN-B (1857.5 g/bump)
机译:我们提出了一种结合使用化学镀镍和模板焊料印刷的低成本倒装芯片技术的可行性和可靠性的研究。图案化了直径为250 / spl mu / m和节距为400 / spl mu / m的圆形铝制凸块,在钝化层中有200 / spl mu / m的开口用于研究。由于已经提出化学镍溶液中的磷会降低焊料的附着力,因此制备了三种化学镍沉积物,作为由化学镍高磷(EN-HP)和化学镍组成的凸点下冶金(UBM)。 -低磷(EN-LP)和化学镍硼(EN-B)。将组成为63Sn-37Pb的共晶铅锡焊膏丝网印刷在化学镍UBM上,然后在230 / spl deg / C的峰值温度下回流。达到的最终焊料凸点高度为155 / spl plusmn / 8 / spl mu / m。发现抗剪强度按EN-B(1857.5 g /块)

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