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Interfacial reaction and joint reliability of fine-pitch flip-chip solder bump using stencil printing method

机译:模版印刷法细间距倒装焊锡凸块的界面反应和接合可靠性

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摘要

This study was focused on the formation and reliability evaluation of solder joints with different diameters and pitches for flip chip applications. We investigated the interfacial reaction and shear strength between two different solders (Sn-37Pb and Sn-3.0Ag-0.5Cu, in wt.%) and ENIG (Electroless Nickel Immersion Gold) UBM (Under Bump Metallurgy) during multiple reflow. Firstly, we formed the flip chip solder bumps on the Ti/Cu/ENIG metallized Si wafer using a stencil printing method. After reflow, the average solder bump diameters were about 130, 160 and 190 μm, respectively. After multiple reflows, Ni_3Sn_4 intermetallic compound (IMC) layer formed at the Sn-37Pb solder/ENIG UBM interface. On the other hand, in the case of Sn-3.0Ag-0.5Cu solder, (Cu,Ni)_6Sn_5 and (Ni,Cu)_3Sn_4 IMCs were formed at the interface. The shear force of the Pb-free Sn-3.0Ag-0.5Cu flip chip solder bump was higher than that of the conventional Sn-37Pb flip chip solder bump.
机译:这项研究的重点是倒装芯片应用中不同直径和间距的焊点的形成和可靠性评估。我们研究了多次回流过程中两种不同焊料(Sn-37Pb和Sn-3.0Ag-0.5Cu,以重量%计)和ENIG(无电镍浸金)UBM(凸块冶金)之间的界面反应和剪切强度。首先,我们使用模版印刷方法在Ti / Cu / ENIG金属化Si晶圆上形成倒装芯片焊料凸点。回流后,平均焊料凸点直径分别约为130、160和190μm。在多次回流之后,Ni_3Sn_4金属间化合物(IMC)层在Sn-37Pb焊料/ ENIG UBM界面处形成。另一方面,在Sn-3.0Ag-0.5Cu焊料的情况下,在界面处形成了(Cu,Ni)_6Sn_5和(Ni,Cu)_3Sn_4 IMC。无铅Sn-3.0Ag-0.5Cu倒装芯片焊料凸块的剪切力高于传统的Sn-37Pb倒装芯片焊料凸块的剪切力。

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