首页> 外文期刊>Journal of Electronic Materials >Interfacial Reaction Between 95Pb-5Sn Solder Bump and 37Pb-63Sn Presolder in Flip-Chip Solder Joints
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Interfacial Reaction Between 95Pb-5Sn Solder Bump and 37Pb-63Sn Presolder in Flip-Chip Solder Joints

机译:倒装芯片焊点中95Pb-5Sn焊料凸块和37Pb-63Sn预焊料之间的界面反应

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摘要

Interdiffusion and interfacial reaction of 95Pb-5Sn solder bumps and 37Pb-63Sn presolder in flip-chip solder joints during high-temperature storage were studied. Reaction temperatures included 100°C, 130°C, 150°C, and 175°C. It was found that Cu6Sn5 and Cu3Sn formed on the board side and (Ni,Cu)3Sn4 formed on the chip side after 100 h of aging. After 2000 h of aging at 175°C, the Ni under-bump metallization (UBM) was exhausted. This caused the (Ni,Cu)3Sn4 layer at the chip-side interface to be gradually converted into (Cu0.6Ni0.4)6Sn5. It was also found that the consumption of the Ni UBM was faster than the case where eutectic Sn-Pb solder was used for the entire joint. Nevertheless, the consumption of the Cu on the substrate side was slower than the case where pure eutectic Sn-Pb solder was used for the entire joint.
机译:研究了高温储存过程中95Pb-5Sn焊料凸块和37Pb-63Sn预焊料在倒装芯片焊点中的扩散和界面反应。反应温度包括100℃,130℃,150℃和175℃。发现在板侧形成了Cu 6 Sn 5 和Cu 3 Sn,并形成了(Ni,Cu) 3 Sn 4 。在175°C下老化2000小时后,Ni凸块下金属化(UBM)耗尽了。这导致芯片侧界面处的(Ni,Cu) 3 Sn 4 层逐渐转换为(Cu 0.6 Ni 0.4 6 Sn 5 。还发现,Ni UBM的消耗量比整个接头使用共晶Sn-Pb焊料的情况要快。但是,与在整个接合处使用纯共晶Sn-Pb焊料的情况相比,基板侧的Cu的消耗要慢。

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