首页> 外文期刊>Journal of Electronic Materials >Interfacial Reaction Between 95Pb-5Sn Solder Bump and 37Pb-63Sn Presolder in Flip-Chip Solder Joints
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Interfacial Reaction Between 95Pb-5Sn Solder Bump and 37Pb-63Sn Presolder in Flip-Chip Solder Joints

机译:倒装芯片焊点中95Pb-5Sn焊料凸块和37Pb-63Sn预焊料之间的界面反应

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摘要

Interdiffusion and interfacial reaction of 95Pb-5Sn solder bumps and 37Pb-63Sn presolder in flip-chip solder joints during high-temperature storage were studied. Reaction temperatures included 100 deg C, 130 deg C, 150 deg C, and 175 deg C. It was found that Cu_(6)Sn_(5) and Cu_(3)Sn formed on the board side and (Ni,Cu)_(3)Sn_(4) formed on the chip side after 100 h of aging. After 2000 h of aging at 175 deg C, the Ni under-bump metallization (UBM) was exhausted. This caused the (Ni,Cu)_(3)Sn_(4) layer at the chip-side interface to be gradually converted into (Cu_(0.6)Ni_(0.4))_(6)Sn_(5). It was also found that the consumption of the Ni UBM was faster than the case where eutectic Sn-Pb solder was used for the entire joint. Nevertheless, the consumption of the Cu on the substrate side was slower than the case where pure eutectic Sn-Pb solder was used for the entire joint.
机译:研究了高温储存过程中95Pb-5Sn焊料凸块和37Pb-63Sn预焊料在倒装芯片焊点中的扩散和界面反应。反应温度包括100℃,130℃,150℃和175℃。发现在板侧上形成了Cu_(6)Sn_(5)和Cu_(3)Sn以及(Ni,Cu)_。 (3)Sn_(4)老化100 h后在芯片侧形成。在175摄氏度下老化2000小时后,镍凸块下金属化(UBM)耗尽了。这导致芯片侧界面处的(Ni,Cu)_(3)Sn_(4)层逐渐转换为(Cu_(0.6)Ni_(0.4))_(6)Sn_(5)。还发现,Ni UBM的消耗要比将共晶Sn-Pb焊料用于整个接头的情况要快。然而,与在整个接缝处使用纯共晶Sn-Pb焊料的情况相比,基板侧的Cu消耗要慢。

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