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Modification of energy relaxation of InGaAs quantum dots by postgrowth thermal annealing

机译:后生长热退火对InGaAs量子点能量弛豫的修正

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Energy relaxation channels of carriers in InGaAs quantum dots (QDs) by multiphonon processes are observed to be changed upon post growth annealing. Self-organized InGaAs QDs in GaAs grown by MOCVD using the Stranski Krastanow (SK) growth mode were systematically thermally treated. The samples were investigated using photoluminescence (PL) and selectively excited photoluminescence (SPL). Upon annealing, the energy states shift towards higher energies, the inhomogeneous broadening is reduced and the phonon energy is changed drastically. It is shown that the changes of the phonon energy are not alone caused by a variation of the In content and the size of the QDs. The Interface phonons is proposed to be the main reason for the changes of the phonon energy.
机译:观察到,通过多声子过程,InGaAs量子点(QD)中载流子的能量弛豫通道在后生长退火后发生了变化。系统地热处理了使用Stranski Krastanow(SK)生长模式通过MOCVD生长的GaAs中的自组织InGaAs QD。使用光致发光(PL)和选择性激发光致发光(SPL)研究了样品。退火后,能态移向更高的能量,不均匀加宽减小,声子能量急剧变化。结果表明,声子能量的变化并非仅由In含量和QD尺寸的变化引起。界面声子被认为是改变声子能量的主要原因。

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