首页> 外文会议>Indium Phosphide and Related Materials, 1998 International Conference on >Long-wavelength lasing from InAs self-assembled quantum dots on (311)B InP by gas-source molecular beam epitaxy
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Long-wavelength lasing from InAs self-assembled quantum dots on (311)B InP by gas-source molecular beam epitaxy

机译:气源分子束外延从(311)B InP上的InAs自组装量子点发射长波长激光

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InAs quantum dots were grown on (311)B InP by self-assembly using gas-source molecular beam epitaxy. 0.33 nm-InAs depositions in nominal thickness formed quantum dots with a lateral dimension of about 43 nm and a density of 2/spl times/10/sup 10/ cm/sup -2/. Laser diodes with seven quantum dot active layers lased evenly at room temperature under a pulsed-current injection mode. At room temperature, a threshold current density of 4.8 kA/cm/sup 2/ and the lasing wavelength of 1.4 /spl mu/m were obtained in a 92%/98% high-reflection coated device with a cavity length of 1.1 mm. Devices with as-cleaved facets lased in a wavelength range from 1.1 to 1.4 /spl mu/m at 77 K. The lasing wavelength changed to a shorter wavelength as the cavity length decreased, indicating gain saturation due to state filling effect in discrete quantum levels, which is typical in quantum dot lasers. Thus, the InAs quantum dots on (311)B InP were found to be promising for active layers in long-wavelength quantum dot lasers.
机译:通过使用气体源分子束外延自组装在(311)B InP上生长InAs量子点。标称厚度的0.33 nm-InAs沉积形成量子点,其横向尺寸约为43 nm,密度为2 / spl乘以10 / sup 10 / cm / sup -2 /。具有七个量子点有源层的激光二极管在室温下以脉冲电流注入模式均匀发射。在室温下,在腔长为1.1mm的92%/ 98%高反射涂层设备中,获得的阈值电流密度为4.8 kA / cm / sup 2 /,激光波长为1.4 / spl mu / m。在77 K时具有裂开面的激光在1.1至1.4 / spl mu / m的波长范围内发射激光。随着腔长度的减小,发射激光波长改变为更短的波长,这表明由于离散量子级中的状态填充效应导致增益饱和,这在量子点激光器中很常见。因此,发现(311)B InP上的InAs量子点有望用于长波长量子点激光器中的有源层。

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