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首页> 外文期刊>Journal of Crystal Growth >Fabrication of low-density self-assembled InAs quantum dots on InP(311)B substrate by molecular beam epitaxy
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Fabrication of low-density self-assembled InAs quantum dots on InP(311)B substrate by molecular beam epitaxy

机译:分子束外延在InP(311)B衬底上制备低密度自组装InAs量子点

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摘要

We developed a method of fabricating low-density InAs self-assembled quantum dots (QDs) on InP(311)B substrates by controlling the substrate temperature, and it was found that the lateral size and height of the InAs QDs increased with increasing substrate temperature. The density of the InAs QDs decreased to 1.28 ×10~(10)/cm~2, which corresponded to one QD per mesa structure, with a diameter of 100 nm. The photoluminescence (PL) property was also investigated, and it showed a clear spectrum even at room temperature at a 1.55 um fiber-optic communications system band. A blueshift of the PL peak wavelength was observed as the size of the InAs QDs increased. This unusual PL property can be explained by In segregation and In re-evaporation at relatively high growth temperature.
机译:我们开发了一种通过控制衬底温度在InP(311)B衬底上制造低密度InAs自组装量子点(QD)的方法,发现InAs QD的横向尺寸和高度随衬底温度的升高而增加。 InAs量子点的密度降低到1.28×10〜(10)/ cm〜2,相当于每个台面结构一个量子点,直径为100nm。还研究了光致发光(PL)特性,即使在室温下1.55 um光纤通信系统频段,它也显示出清晰的光谱。随着InAs QD尺寸的增加,PL峰值波长发生了蓝移。这种不寻常的PL特性可以通过在相对高的生长温度下的In偏析和In再蒸发来解释。

著录项

  • 来源
    《Journal of Crystal Growth》 |2013年第1期|450-453|共4页
  • 作者单位

    Nationat Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan;

    Nationat Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Nanostructures; A3. Molecular beam epitaxy; B2. Semiconducting Ⅲ-Ⅴ materials;

    机译:A1。纳米结构;A3。分子束外延;B2。半导体Ⅲ-Ⅴ材料;

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