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Epitaxial growth and properties of cubic group III-nitride layers

机译:立方III族氮化物层的外延生长和性能

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Abstract: Single-phase cubic GaN and InN layers are grown by plasma assisted MBE. The temperature-dependence of the surface reconstruction is elaborated. The structural stability of the cubic growth in dependence of the growth stoichiometry is studied by RHEED measurements and numerical simulations of the experimental RHEED patterns. Growth oscillations on cubic GaN and during the growth of GaN-InN single quantum wells are recorded at nearly stoichiometric adatom coverage. Photoluminescence reveals the dominant optical transitions of cubic GaN and InN. Using in-situ RHEED to control the surface stoichiometry it is possible to grow N-stabilized layers resulting in intrinsic p-type GaN epilayers with hole concentrations of about p $EQ 1 $MUL 10$+13$/ cm$+$MIN@3$/ and mobilities of about $mu$-p$/ $EQ 320 cm2/Vs, respectively. !18
机译:摘要:通过等离子体辅助MBE生长单相立方GaN和InN层。详细说明了表面重建的温度依赖性。通过RHEED测量和实验RHEED模式的数值模拟研究了立方生长的结构稳定性(取决于生长化学计量)。在接近化学计量的原子覆盖率下记录了立方氮化镓上以及氮化镓-氮化镓单量子阱生长期间的生长振荡。光致发光揭示了立方氮化镓和InN的主要光学跃迁。使用原位RHEED控制表面化学计量,可以生长N稳定层,从而产生本征p型GaN外延层,其空穴浓度约为p $ EQ 1 $ MUL 10 $ + 13 $ / cm $ + $ MIN @ 3 $ /和迁移率分别约为$ mu $ -p $ / $ EQ 320 cm2 / Vs。 !18

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