Electronic image adjustment device for e-beam lithography

摘要

Abstract: A cumbersome necessity in lithography tools is the need to provide for a mechanical wafer rotation in order to achieve overlay. In contrast to photolithographic tools, charged particle lithography systems potentially offer a non- mechanical means of adjusting image orientation through the use of magnetic fields. I have identified a type of device, based upon simple, solenoid-like coils, which can simultaneously provide independent electronic adjustments to both image rotation and magnification. The implementation of such a device in a SCALPEL$+TM$/-based proof-of-lithography tool is presented as a practical example.!9