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A New RDL-First PoP Fan-Out Wafer-Level Package Process with Chip-to-Wafer Bonding Technology

机译:采用芯片对晶圆键合技术的新型RDL-First PoP扇出晶圆级封装工艺

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Fan-Out Wafer-Level Interposer Package-on-Package (PoP) design has many advantages for mobile applications such as low power consumption, short signal path, small form factor and heterogeneous integration for multi-functions. In addition, it can be applied in various package platforms, including PoP, System-in-Package (SiP) and Chip Scale Package (CSP). These advantages come from advanced interconnection technology called a redistribution layer (RDL).However, a PoP-type RDL-base platform requires dual-side RDLs on both top and bottom sides to stack another package on top. In a monolithic process flow, that means the second RDL only can be fabricated after finishing all the first RDL and the assembly processes such as flip-chip bonding, molding and grinding. Therefore, this process flow is not quite as advantageous as a non-PoP type platform because chips can be lost during the second RDL process.In this paper, to address this RDL-base Interposer PoP challenge, a real chip-last process flow with a chip-to-wafer (C2W) bonding technology is introduced. And the results are presented of building and testing an RDL-base wafer-level Interposer PoP with a size of 12.5 x 12.5 mm2 and thickness of 0.357 mm including solder ball. The bottom side has a 3-layer RDL structure and the top RDL for the package stacking has a 1-layer structure. These RDLs are implemented with copper (Cu) lines with 5 μm/10 μm of line & space (L/S) and copper (Cu) cored solder balls (CCSBs) are used as the vertical interconnect components. The silicon die and CCSBs’ joint quality is confirmed by reliability testing. The test vehicle package passed all the reliability tests of moisture resistance test (MRT) L3, Temperature Cycle, Condition B (TCB) 1,000 cycles and high temperature storage (HTS) 1,000 hrs.
机译:扇出晶圆级中介层级封装(PoP)设计在移动应用中具有许多优势,例如低功耗,短信号路径,小外形和多功能集成。此外,它还可以应用于各种封装平台,包括PoP,系统级封装(SiP)和芯片级封装(CSP)。这些优势来自称为重分布层(RDL)的高级互连技术。但是,基于PoP的RDL平台需要在顶部和底部都具有双面RDL,才能在顶部堆叠另一个封装。在单片工艺流程中,这意味着只有在完成所有第一RDL和组装过程(例如倒装芯片键合,模塑和研磨)之后,才能制造第二RDL。因此,该处理流程不如非PoP类型的平台有优势,因为在第二个RDL处理过程中可能会丢失芯片。在本文中,为了解决基于RDL的Interposer PoP挑战,真正的芯片后处理流程引入了芯片到晶圆(C2W)接合技术。并给出了构建和测试尺寸为12.5 x 12.5 mm的基于RDL的晶圆级中介层PoP的结果 2 厚度为0.357毫米(包括焊球)。底侧具有3层RDL结构,而顶部RDL用于封装堆叠具有1层结构。这些RDL由具有5μm/ 10μm线距和间隔(L / S)的铜(Cu)线实现,并且铜(Cu)芯焊球(CCSB)用作垂直互连组件。硅芯片和CCSB的联合质量通过可靠性测试得到确认。测试车辆包装通过了所有耐湿性测试(MRT)L3,温度循环,条件B(TCB)1,000次循环和高温存储(HTS)1,000小时的可靠性测试。

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