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Fine-Pitch RDL Integration for Fan-Out Wafer-Level Packaging

机译:细间距RDL集成,用于扇出晶圆级封装

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Fan-Out wafer-level packaging (FOWLP) semi-additive process (SAP) flow for three layers of redistribution layer (RDL) has been developed. Patched dicing lane design is adopted to improve RDL plating uniformity by ~40x, as measured by sheet resistance (Rs). We demonstrate warpage correction solution to improve pattern integrity despite tool handling limitations. We also demonstrate a CMP solution to improve 2/2um L/S RDL pattern integrity by >10x. We achieve RDL mechanical integrity through an integrated endpoint-detection-controlled wet etch solution to achieve <50nm undercut and extend SAP process to sub-2/2um L/S RDL. We also establish RDL electrical integrity by integrating wafer treatment solution after RDL formation to achieve line-to-line leakage current <0.1nA. Upon completion of wafer-level process, package assembly is carried out using SAC305 BGA onto PCB. Package integrity is examined using X-ray, followed by a progressive thermal cycling (TC) reliability test. RDL mechanical and electrical integrity is proven from the board-level reliability test where the RDL layers pass 1000 TC and failure occurs on the BGA level.
机译:已经开发了三层再分配层(RDL)的扇出晶圆级封装(FOWLP)半添加工艺(SAP)流程。采用贴片切割道设计,以薄层电阻(Rs)衡量,RDL镀层均匀性提高了约40倍。我们展示了翘曲校正解决方案,尽管存在工具处理方面的限制,但仍可改善图案完整性。我们还演示了CMP解决方案,可将2 / 2um L / S RDL模式的完整性提高10倍以上。我们通过集成的端点检测控制的湿法蚀刻解决方案来实现RDL机械完整性,以实现<50nm的底切,并将SAP工艺扩展到2 / 2um L / S RDL。我们还通过在RDL形成后集成晶片处理溶液来建立RDL电气完整性,以实现线间泄漏电流<0.1nA。晶圆级工艺完成后,使用SAC305 BGA将封装组装到PCB上。使用X射线检查包装的完整性,然后进行渐进式热循环(TC)可靠性测试。通过板级可靠性测试证明了RDL的机械和电气完整性,其中RDL层通过了1000 TC,并且故障发生在BGA级别。

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