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Dynamic stress and reliability analysis for bonded wafer during wafer grinding process

机译:晶圆研磨过程中键合晶圆的动态应力和可靠性分析

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Grinding of bonded wafers is an essential process for fabricating 3D stacked wafer. However, due to the complex structures and various materials of bonded wafers, the risk of cracks in the grinding process of the wafer is greatly increased. In this paper, a dynamic finite element method for grinding of bonded wafer is developed to study the grinding-induced stress. It was found that the heterogeneous structure of the bonded wafer has a large effect on the stress distribution, which is about 17 times higher than the contact pressure between the grinding wheel and the workpiece. The effects of Cu bump diameter/ pitch/ height on stress distribution were also analyzed and discussed.
机译:粘合晶圆的研磨是制造3D堆叠晶圆的必不可少的过程。然而,由于键合晶片的复杂结构和各种材料,大大增加了晶片研磨过程中破裂的风险。本文研究了一种动态有限元法对键合晶片进行磨削,以研究磨削引起的应力。已经发现,键合晶片的异质结构对应力分布有很大的影响,比砂轮和工件之间的接触压力高约17倍。分析和讨论了铜凸块直径/间距/高度对应力分布的影响。

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