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A study on lightly-doped Cylindrical surrounding-gate 6H-SiC nanowire FET

机译:轻掺杂圆柱形栅极6H-SiC纳米线FET的研究

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The device characteristics of Cylindrical surrounding-gate (CSG) 6H-SiC NW FET is investigated in this paper. The results indicate that the surface potential, threshold voltage and the electric characteristics (transfer characteristics and output characteristics) is very sensitive to 6H-SiC nanowire radius, channel length, oxide thickness and temperature. The temperature dependence of CSG 6H-SiC NW FET is also discussed in this paper. When the nanowire radius is decreased, the minimum potential is lowered, the locations of minimum potential moves to the source side and the threshold voltage is increased. When the oxide thickness is increased, the locations of minimum potentials are not changed, but the minimum potentials themselves become larger and the threshold voltage become smaller. The minimum potential increases as the gate length decreases, but the threshold voltage decreased as the gate length decreases. With increasing temperature, the surface potential decreases and the location of minimum potential moves to the source side. The threshold voltage decreases monotonically with temperature. At strong inversion region, the drain current decrease as nanowire radius decreases, but increases as temperature decreases.
机译:本文研究了圆柱周围栅极(CSG)6H-SiC NW FET的装置特性。结果表明,表面电位,阈值电压和电特性(传递特性和输出特性)对6H-SiC纳米线半径,通道长度,氧化物厚度和温度非常敏感。本文还讨论了CSG 6H-SiC NW FET的温度依赖性。当纳米线半径降低时,最小电位降低,最小电位的位置向源侧移动并且阈值电压增加。当氧化物厚度增加时,不会改变最小电位的位置,但是最小电位本身变大,并且阈值电压变小。随着栅极长度的降低,最小电位增加,但随着栅极长度的减小而降低阈值电压。随着温度的增加,表面电位降低,并且最小电位的位置移动到源极侧。阈值电压随温度单调减小。在强倒置区域,漏极电流随着纳米线半径的降低而降低,但随着温度降低而增加。

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