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Development of high yield, reliable fine pitch flip chip interconnects with copper pillar bumps and thin coreless substrate

机译:开发具有铜柱凸点和薄型无芯基板的高产量,可靠的小间距倒装芯片互连

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Electronic packages with fine pitch copper pillar bump interconnect and thin coreless substrate has become a satisfying solution for advanced integrated circuit (IC) to achieve miniaturization and high performance. However, non-wetting and poor interconnection issues of small and fine pitch copper pillar bumps due to large warpage of thin coreless substrate are the most common failure phenomenon during flip chip reflow process. In this work, the warpage of thin two layer coreless substrate during flip chip reflow process is comprehensively studied by using Shadow Moiré technique. A few design options are proposed and analyzed by DOE methodology, including prepreg stack-up design, metal trace design, designs with different metal layer thickness and solder mask thickness. These design options are then studied to understand their effectiveness for warpage improvement, and to figure out the optimized designs for minimum substrate warpage. From the results, it is found that the prepreg stack-up design is not effective for warpage reduction, but a significant option for improving warpage consistency at different location through the whole substrate strip during reflow process, choosing proper lamination process is helpful and important. Increasing metal layer thickness is an effective way for warpage improvement. Thick metal layer is not only beneficial for warpage reduction but also shows more consistency of warpage at different location through the whole substrate strip. It is also found that the thinner solder mask is an effective way for warpage reduction and warpage consistency improvement. Metal trace design is not effective for substrate warpage improvement. Final optimized design is obtained to improve substrate warpage, and to eliminate non-wetting and poor interconnection issues. The assembly yield of flip chip process can be substantially improved from 85.7% in preliminary design to 99.7% after optimization.
机译:具有细间距铜柱凸点互连和薄型无芯基板的电子封装已成为高级集成电路(IC)实现小型化和高性能的令人满意的解决方案。然而,由于薄的无芯基板的大翘曲而引起的小间距和细间距铜柱凸块的非润湿性和不良互连问题是倒装芯片回流过程中最常见的故障现象。在这项工作中,使用ShadowMoiré技术全面研究了薄两层无芯基板在倒装芯片回流过程中的翘曲。通过DOE方法提出并分析了一些设计选项,包括预浸料叠层设计,金属走线设计,具有不同金属层厚度和阻焊层厚度的设计。然后研究这些设计方案,以了解其改善翘曲的有效性,并找出最小化基板翘曲的优化设计。从结果发现,预浸料的叠层设计对于减少翘曲不是有效的,但是对于在回流工艺期间改善整个基板条带在不同位置处的翘曲一致性的重要选择,选择合适的层压工艺是有益且重要的。增加金属层厚度是改善翘曲的有效方法。厚的金属层不仅有利于减少翘曲,而且在整个基板带材的不同位置处都显示出更大的翘曲一致性。还发现较薄的阻焊层是减少翘曲和改善翘曲一致性的有效方法。金属走线设计对改善基板翘曲无效。获得了最终的优化设计,以改善基板翘曲,并消除不润湿和不良的互连问题。倒装芯片工艺的组装良率可以从初步设计的85.7%大幅提高到优化后的99.7%。

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