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Breakthrough development of ultimate ultra-fine pitch process with gold wire copper wire in QFN packages

机译:QFN封装的金线和铜线的极细间距工艺的突破性发展

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In order to obtain breakthrough competitive edge in semiconductors industry that requires cost effective miniaturization, the wire bonding process needs to be renewed to highest possible level. The combination of extremely small pitch size with both gold (Au) and copper (Cu) wire in QFN packages provided the best opportunity of success. However, development of such process is also extremely challenging, it requires significant improvement in all aspects of wire bonding process. Base on the detailed analysis, the wire bonding pitch size of 20 um should become the target of ultimate ultra-fine pitch (UUFP) process. The bonding with Au & Cu wire provides both options of quality and cost, and QFN were selected as vehicle package which represents the most popular package platform. The major challenges of UUFP process include development of smallest wire size, capillary design, machine capability and process window optimization. From multiple engineering studies, it was determined that the smallest wire size is 0.4 mil (10 um) for Au and 0.5 mil (12.5 um) for Cu. These wires were developed through research of dopant contents, process flow modification enhancement (additional die sets) and parameters optimization. In parallel, capillary dimensions and tolerances were revised several times to accommodate these extremely small wire sizes. Most of the major capillary dimensions were designed up to the physical material limitations. In the early design stage, there were several incidents of capillary tip breakage due to its thin wall was not able to withstand too much bonding stress. The final optimum capillary design could achieve reasonable good results with new tighten tolerances and further enhancement could even achieve stable and robust production performance. With the readiness of direct and indirect material, subsequent study was conducted on machine capability. Most of the parameters resolution needs to be improved in order to enable most precise setting within - he tight operating range. The required task was working out optimum process window through comprehensive study, involving multiple DOE (Design of Experiment) and RSM (Response Surface Method). In the process optimization, the critical challenges are not only limited to making smaller bonded ball. All the previous discovered issues with Au wire, Cu wire and QFN bonding would be amplified. Some of those issues include Cu wire displacement/damage, Cu wire lifted bond, Cu wire 2nd bond challenges, QFN leadframe resonance issue [1], Au wire inter-metallic issue, etc. All these challenges have main effect and interaction effect, making the screening and optimization efforts becoming very complicated. Only with comprehensive optimization, a robust and good process window could be obtained. The optimum UUFP process promised to offer the most miniature package together with the most effective cost, as the ultimately competitive solution to obtain largest market share.
机译:为了在需要成本有效地小型化的半导体行业中获得突破性的竞争优势,需要将引线键合工艺更新到尽可能高的水平。 QFN封装中极小的节距与金(Au)和铜(Cu)线的结合提供了成功的最佳机会。然而,这种工艺的开发也极具挑战性,它要求在引线键合工艺的各个方面进行重大改进。根据详细的分析,20微米的引线键合间距尺寸应成为最终超细间距(UUFP)工艺的目标。与金和铜丝的结合提供了质量和成本的选择,并且QFN被选为汽车封装,代表了最流行的封装平台。 UUFP工艺的主要挑战包括最小线径的开发,毛细管设计,机器性能和工艺窗口优化。根据多项工程研究,确定最小的导线尺寸对于Au为0.4百万(10 um),对于Cu为0.5百万(12.5 um)。这些导线是通过研究掺杂物含量,改进工艺流程(增加模具)和优化参数来开发的。同时,对毛细管的尺寸和公差进行了多次修改,以适应这些极小的导线尺寸。大多数主要毛细管尺寸均根据物理材料的限制而设计。在设计初期,由于薄壁无法承受太大的粘结应力,因此发生了多次毛细管尖端破裂的事件。最终的最佳毛细管设计可以以新的紧固公差获得合理的良好结果,进一步增强甚至可以实现稳定而稳定的生产性能。随着直接和间接材料的使用,随后对机器性能进行了研究。为了在最狭窄的操作范围内实现最精确的设置,需要提高大多数参数的分辨率。所需的任务是通过全面的研究制定出最佳的工艺窗口,其中涉及多个DOE(实验设计)和RSM(响应面方法)。在工艺优化中,关键挑战不仅限于制造更小的键合球。以前发现的所有与金线,铜线和QFN焊接有关的问题都会被放大。其中一些问题包括铜线位移/损坏,铜线提升键合,铜线第二键合挑战,QFN引线框架共振问题[1],金线金属间问题等。所有这些挑战具有主要作用和相互作用作用,筛选和优化工作变得非常复杂。只有进行全面的优化,才能获得可靠且良好的过程窗口。最佳的UUFP工艺有望提供最小的包装和最有效的成本,作为获得最大市场份额的最终竞争解决方案。

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