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Deep UV Sensors Using Surface Acoustic Wave Oscillators Fabricated on Single Crystalline AlN Films Grown on Sapphire Substrates

机译:使用在蓝宝石基板上生长的单晶ALN薄膜上制造的表面声波振荡器的深紫外线传感器

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Epitaxial single crystal AlN thin films have been obtained on (001) sapphire substrates by helicon sputtering system at growth temperature of 450°C. Surface acoustic wave (SAW) filters were fabricated on AlN/sapphire. The center frequency is 354.2MHz, which corresponds to a phase velocity of 5667 m/s. The insertion loss and sidelobe rejection were about 24.9dB and 11.4dB, respectively. The value of TCF is measured to be -74.9 ppm/°C and -65.76 ppm/°C at 0.4μm and 1μm of film thickness, respectively. The temperature coefficient of frequency (TCF) of AlN/sapphire shows proportional to the film thickness. A frequency downshift about 43 KHz was observed when the UV source with the wavelength of around 200nm and 12 mW/cm~2 of power density radiates the surface of SAW devices.
机译:通过在450℃的生长温度下通过Helicon溅射系统获得外延单晶ALN薄膜在(001)蓝宝石基材上。表面声波(锯)过滤器在AlN / Sapphire上制造。中心频率为354.2MHz,其对应于5667 M / s的相速度。插入损耗和侧链排斥分别为约24.9dB和11.4dB。 TCF的值分别测量为-74.9ppm /°C和-65.76ppm /°C,分别为0.4μm和1μm的膜厚度。 ALN / SAPPHIRE的温度系数(TCF)显示与膜厚度成比例。当具有波长约为200nm和12mW / cm〜2的功率密度的UV源辐射SAW器件的表面时,观察到约43kHz的频率降档。

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