首页> 外文会议>2010 the 5th IEEE Conference on Industrial Electronics and Applications >Deep UV sensors using surface acoustic wave oscillators fabricated on single crystalline AlN films grown on sapphire substrates
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Deep UV sensors using surface acoustic wave oscillators fabricated on single crystalline AlN films grown on sapphire substrates

机译:使用在蓝宝石衬底上生长的单晶AlN膜上制造的表面声波振荡器的深紫外传感器

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Epitaxial single crystal AlN thin films have been obtained on (001) sapphire substrates by helicon sputtering system at growth temperature of 450°C. Surface acoustic wave (SAW) filters were fabricated on AlN/sapphire. The center frequency is 354.2MHz, which corresponds to a phase velocity of 5667 m/s. The insertion loss and sidelobe rejection were about 24.9dB and 11.4dB, respectively. The value of TCF is measured to be −74.9 ppm/°C and −65.76 ppm/°C at 0.4 µm and 1 µm of film thickness, respectively. The temperature coefficient of frequency (TCF) of AlN/sapphire shows proportional to the film thickness. A frequency downshift about 43 KHz was observed when the UV source with the wavelength of around 200nm and 12 mW/cm2 of power density radiates the surface of SAW devices.
机译:在450℃的生长温度下,通过螺旋溅射系统在(001)蓝宝石衬底上获得了外延单晶AlN薄膜。在AlN /蓝宝石上制造了表面声波(SAW)滤波器。中心频率为354.2MHz,对应于5667 m / s的相速度。插入损耗和旁瓣抑制分别约为24.9dB和11.4dB。在膜厚度为0.4 µm和1 µm时,测得的TCF值分别为-74.9 ppm /°C和-65.76 ppm /°C。 AlN /蓝宝石的频率温度系数(TCF)与膜厚成正比。当波长为200nm左右且功率密度为12 mW / cm 2 的紫外线源辐射到声表面波器件的表面时,观察到频率下降约43 KHz。

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