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FABRICATION OF HYBRID MICRO-NANOFLUIDIC DEVICES WITH CENTIMETER LONG ULTRA-LOW ASPECT RATIO NANOCHANNELS

机译:含有厘米长超低纵横比纳米通道的杂交微纳米流体装置的制备

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Hybrid microfluidic and nanofluidic devices have a variety of applications including water desalination, molecular gates and DNA sieving among several other lab-on-chip uses. Most microfluidic and nanofluidic devices currently are fabricated in glass, silicon, polydimethylsiloxane (PDMS), or with a combination of these materials. In order to impart functionality, metals, polymers or auxiliary components are often integrated with these devices. Ultra-low aspect ratio channels have several advantages including critical dimensions on the nanoscale but increased throughput compared to higher aspect ratio channels with the same critical dimension, which is important for applications where a higher volumetric flow rate is desired. Additionally, theoretical analysis is significantly easier as ultra-low aspect ratio channels can be modeled as 1-D systems. The fabrication methods for achieving low aspect ratios (< 0.005) usually require extensive facilities with several innovative fabrication and bonding schemes being previously reported. In this paper, we report on fabrication and bonding of ultra-low aspect ratio microfluidic and nanofluidic devices with aspect ratios at 0.0005 in glass/PDMS devices in contrast to the previous best reported result of 0.005 achieved in a silica device using stamp and stick PDMS bonding. The simplicity of our approach presents a new pathway to achieving the lowest aspect ratio nanochannels ever reported for channels fabricated using an interfacial layer for bonding. Centimeter long nanochannels on a borosilicate substrate were fabricated by standard UV photolithography followed by wet etching. Surface roughness of the fabricated channels is on the same order as the roughness of the initial substrate (2-3 ran) and therefore can enable fabrication of channels with critical dimensions approaching 15 ran or less. Devices were then bonded using a second borosilicate substrate with a thin PDMS adhesion layer (~ 2 μm). The PDMS adhesion layer allows rapid, facile, and alignment-free bonding compared to traditional fusion or anodic bonds. Successful verification of device operation and functionality was determined by verifying flow in operational devices and with scanning electron microscopy to confirm bonding for the formation of nanochannels.
机译:杂化微流体和纳米流体装置具有各种应用,包括筛分其他芯片用水脱盐,分子门和DNA筛分。目前大多数微流体和纳米流体装置在玻璃,硅,聚二甲基硅氧烷(PDMS)或这些材料的组合中制造。为了赋予功能,金属,聚合物或辅助组件通常与这些装置集成。超低纵横比通道具有若干优点,包括纳米级上的临界尺寸,但与具有相同关键尺寸的较高宽高比通道相比,吞吐量增加,这对于需要较高的体积流速的应用是重要的。另外,理论分析明显更容易,因为超低纵横比通道可以被建模为1-D系统。用于实现低纵横比的制造方法(<0.005)通常需要具有若干创新制造和先前报道的粘合方案的广泛设施。在本文中,我们在玻璃/ PDMS装置中以0.0005的横向比的超低纵横比微流体和纳米流体装置的制造和粘合报告,与使用印模和棒PDMS在二氧化硅装置中实现的0.005的最佳报道结果相反粘接。我们的方法的简单性呈现了实现使用界面层制造的通道的最低纵横比纳米通道的新途径。硼硅酸盐基材上的厘米长纳米通过标准UV光刻,然后湿法蚀刻制造。制造通道的表面粗糙度与初始基板的粗糙度相同,因为初始基板的粗糙度(2-3 RAN),因此可以使得能够制造具有接近15或更小的临界尺寸的通道。然后使用具有薄PDMS粘附层(〜2μm)的第二硼硅酸盐基底粘合装置。与传统的融合或阳极键相比,PDMS粘附层允许快速,容易的,并对取向键合。通过验证操作装置中的流量和扫描电子显微镜来确定装置操作和功能的成功验证,以确认纳米纳米的形成。

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