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Influence of Plasmon Scattering on Low Field Electron Mobility in Wurtzite and Zincblend GaN

机译:等离子体散射对纤锌矿和Zincblend GaN中低场电子迁移率的影响。

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Temperature and doping dependencies of electron mobility in both wurtzite and zincblend GaN structures have been calculated using an iterative technique. The following scattering mechanisms, i.e. impurity, polar optical phonon, acoustic phonon, piezoelectric and electron plasmon are included in the calculation. Ionized impurity scattering has been treated beyond the Born approximation using the phase-shift analysis. It is found that the electron mobility decreases monotonically as the temperature increases from 100K to 600K. The low temperature value of electron mobility increases significantly with increasing doping concentration. The iterative results are in fair agreement with other recent calculations obtained using the relaxation-time approximation and experimental methods.
机译:使用迭代技术已经计算出纤锌矿型和锌混合型GaN结构中电子迁移率的温度和掺杂依赖性。计算中包括以下散射机制,即杂质,极性光子,声子,压电和电子等离激元。已使用相移分析对电离杂质散射进行了超出Born近似的处理。发现随着温度从100K增加到600K,电子迁移率单调降低。电子迁移率的低温值随着掺杂浓度的增加而显着增加。迭代结果与使用弛豫时间近似和实验方法获得的其他最新计算结果完全吻合。

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