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Influence of Plasmon Scattering on Low Field Electron Mobility in Wurtzite and Zincblend GaN

机译:等离子体散射对紫立茨和ZINNBLEND GAN的低现场电子迁移率的影响

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Temperature and doping dependencies of electron mobility in both wurtzite and zincblend GaN structures have been calculated using an iterative technique. The following scattering mechanisms, i.e. impurity, polar optical phonon, acoustic phonon, piezoelectric and electron plasmon are included in the calculation. Ionized impurity scattering has been treated beyond the Born approximation using the phase-shift analysis. It is found that the electron mobility decreases monotonically as the temperature increases from 100K to 600K. The low temperature value of electron mobility increases significantly with increasing doping concentration. The iterative results are in fair agreement with other recent calculations obtained using the relaxation-time approximation and experimental methods.
机译:使用迭代技术计算了Wurtzite和Zincblend GaN结构中电子迁移率的温度和掺杂依赖性。以下散射机构,即杂质,极光声子,声学声子,压电和电子等离子体包括在计算中。使用相移分析已经超出了超出了出生的近似的电离杂质散射。结果发现,随着温度从100K至600K的增加,电子迁移率将单调减小。随着掺杂浓度的增加,电子迁移率的低温值显着增加。迭代结果与使用弛豫时间近似和实验方法获得的其他最近计算的公平协议。

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