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Blue photoluminescence emission from thermal SiO/sub 2/ films implanted with carbon

机译:注入碳的热SiO / sub 2 /薄膜发出的蓝色光致发光

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The structures formed after the implantation of carbon in thermal SiO/sub 2/ and annealing present visible photoluminescence (PL) bands at room temperature. The peak wavelength and intensity of PL bands depend strongly on the temperature of annealing. In contrast, only very weak PL bands are observed after the implantation of argon in thermal SiO/sub 2/ and similar annealing. IR, Raman, SIMS and HRTEM were also used to characterize the microstructure of the carbon or argon implanted thermal SiO/sub 2/ films. These observations show that carbon aggregates are probably the origin of blue PL bands.
机译:碳在热SiO / sub 2 /中注入并退火后形成的结构在室温下呈现可见光致发光(PL)带。 PL带的峰值波长和强度在很大程度上取决于退火温度。相反,在热SiO / sub 2 /中注入氩气和类似的退火之后,仅观察到非常弱的PL带。红外,拉曼,SIMS和HRTEM也用于表征碳或氩注入的SiO / sub 2 /热敏薄膜的微观结构。这些观察结果表明,碳聚集体可能是蓝色PL谱带的起源。

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