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Modeling the I-V characteristics of fully-depleted SOI MOSFETs including self-heating

机译:对包括自发热在内的全耗尽SOI MOSFET的I-V特性建模

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Fully-depleted Silicon-On-Insulator (SOI) MOSFETs are a strong potential candidate for future ULSI CMOS applications. In order to evaluate the merits of these devices an accurate model of the output characteristics applicable to sub-half micron channel lengths is needed. Previous work on modeling the I-V (current-voltage) characteristics of thin-film SOI MOSFETs has mainly been based on inaccurate velocity-field relation for carriers in the channel region. Moreover, in most models, conductance and capacitances show discontinuities at the transition points from subthreshold to saturation to linear regions. In this paper we report a physically based continuous analytical model for SOI MOSFETs that is represented by a single drain current equation valid in all regions of device operation ofinterest.
机译:完全耗尽的硅 - 绝缘体(SOI)MOSFET是未来ULSI CMOS应用的强大潜在候选者。为了评估这些装置的优点,需要一种适用于子半微沟道长度的输出特性的精确模型。以前的薄膜SOI MOSFET的I-V(电流电压)特性建模的工作主要是基于沟道区域载波的不准确的速度场关系。此外,在大多数模型中,电导和电容在从亚阈值到饱和度到线性区域的过渡点处的不连续性。在本文中,我们向SOI MOSFET报告了一种物理基础的连续分析模型,该模型由在互连的设备操作的所有区域中有效的单个漏极电流方程表示。

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