首页> 外文会议>International Symposium on Ultra Clean Processing of Silicon Surfaces(UCPSS); 20060918-20; Antwerp(BE) >X-ray spectrometry for wafer contamination analysis and speciation as well as for reference-free nanolayer characterization
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X-ray spectrometry for wafer contamination analysis and speciation as well as for reference-free nanolayer characterization

机译:X射线光谱法,用于晶圆污染分析和形态分析,以及无参的纳米层表征

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摘要

Total-reflection, grazing-incidence and reference-free X-ray fluorescence analysis employing synchrotron radiation can substantially contribute to the contamination analysis and speciation on semiconductor surfaces as well as to the characterization of nanolayered systems. The continuing development of instrumentation by PTB is dedicated to high-end investigations in the R&D of semiconductor samples related to industrial applications.
机译:使用同步加速器辐射的全反射,掠入射和无参考X射线荧光分析可大大有助于对半导体表面进行污染分析和形成物种,并有助于纳米层系统的表征。 PTB仪器的不断发展致力于与工业应用相关的半导体样品研发中的高端研究。

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