Microfabrication and Performance of Annealed NiTi Shape Memory Thin Films by Sputtering for Microdevice Applications

摘要

The microfabrication and performance NiTi shape memory thin films for microdevice applications were studied by microfabrication processes, which were compatible with those of microelectronics fabrication processes. The sputter-deposition conditions, patterning process, and annealing conditions were investigated. The B2 crystal structures of the thin films can be obtained by annealing at 525℃ for 30min. The results from x-ray photoemission spectroscopy indicated that the atomic concentration in the surface of the annealed thin films with preferred structures is comparable with those of the as-deposited films.