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Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device
Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device
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机译:双态,成分渐变,溅射沉积的薄膜形状存储器件
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摘要
The present invention discloses devices and a method of fabrication of devices using a shape memory effect, thin film with a compositional gradient through the thickness of the film. Specifically, a NiTi SME thin film is disclosed that can be used in actuators, MEMS devices and flow control. The process of fabrication includes a gradual heating of the target over time during the sputter deposition of a thin film on a substrate under high vacuum, without compositional modification. The resulting thin film exhibits two-way shape memory effect that can be cyclically applied without an external bias force.
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