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Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films

机译：低温结晶对溅射沉积的Ti-Ni非晶薄膜形状记忆行为及微观结构的影响

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Hiroki Cho; Jae Il Kim; Hee Young Kim; Shuichi Miyazaki;
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年度 2005
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1. Microstructure of Sputter-Deposited Ti-Ni Shape Memory Alloy Thin Films [J] . Shuichi Miyazaki, Junpei Sakurai, Jaeil Kim まてりあ . 2000,第12期

机译：溅射沉积Ti-Ni形状记忆合金薄膜的微观结构
2. The effect of crystallizing procedure on microstructure and characteristics of sputter-deposited TiNi shape memory thin films [J] . Liu YS, Xu D, Jiang BH, Journal of Micromechanics and Microengineering . 2005,第3期

机译：结晶工艺对溅射沉积TiNi形状记忆薄膜组织和性能的影响
3. Crystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films [J] . S. Rios I. Karaman and X. Zhang Applied Physics Letteres . 2010,第17期

机译：溅射沉积NiMnCoIn薄膜的结晶和高温形状记忆行为
4. Stability of shape memory characteristics against cyclic deformation in Ti-Ni sputter-deposited thin films [C] . Kuniaki Nomura, Univ. of Tsukuba, Tsukuba Ibaraki, Smart Structures and Materials 1995: Smart Materials . 1995

机译：Ti-Ni溅射沉积薄膜中形状记忆特性对循环变形的稳定性
5. Crystallization and martensitic transformation behavior of nickel-titanium shape memory alloy thin films. [D] . Wang, Xi. 2007

机译：镍钛形状记忆合金薄膜的结晶和马氏体转变行为。
6. Voltage-Polarity Dependent Programming Behaviors of Amorphous In–Ga–Zn–O Thin-Film Transistor Memory with an Atomic-Layer-Deposited ZnO Charge Trapping Layer [O] . Dan-Dan Liu, Wen-Jun Liu, Jun-Xiang Pei, 2019

机译：带有原子层沉积ZnO电荷陷阱层的非晶In-Ga-Zn-O薄膜晶体管存储器的电压极性相关编程行为
7. Martensitic Transformation and Two-Way Shape Memory Effect of Sputter-Deposited Ni-Rich Ti-Ni Alloy Films [O] . Atsuo Gyobu, Yoshio Kawamura, Toshio Saburi, 1999

机译：马氏体转化和溅射沉积的Ni-Ni Ti-Ni合金薄膜的双向形状记忆效应

Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films

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