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Effect of the composition and thermal annealing on the transformation temperatures of sputtered TiNi shape memory alloy thin films

机译:组成和热退火对溅射TiNi形状记忆合金薄膜相变温度的影响

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摘要

After sputter-deposited amorphous TiNi films were subjected to heat treatment higher than 600 K, the shape memory alloys (SMAs) showed strong dependence of the transformation temperatures on heat treatment conditions and composition. Unlike Ni- rich films, the transformation temperatures of Ti-rich films are above the ambient temperature and largely depend on annealing temperatures from 600 to 120 K. But they remain relatively constant on the various annealing temperature domains, 600-740 K, 740-1000 K, 1000 K +, delimited by exothermic peaks originating from the formation of precipitates.
机译:在对溅射沉积的非晶态TiNi膜进行高于600 K的热处理后,形状记忆合金(SMA)表现出相变温度对热处理条件和成分的强烈依赖性。与富镍薄膜不同,富钛薄膜的转变温度高于环境温度,并且在很大程度上取决于600至120 K的退火温度。但是在各种退火温度域(600-740 K,740- 1000 K,1000 K +,由析出物形成引起的放热峰界定。

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