Department of Electrical Engineering and Center for Solid State Electronics Research, Arizona State University, Tempe, AZ, 85287-5706, USA;
oxidation; stacking faults; polytype transformation; photoluminescence; raman scattering; heavy doping; electrostatic force microscopy; secondary electron imaging;
机译:重氮掺杂4H-SiC晶体热退火过程中双Shockley堆垛层错周围部分的固定化现象
机译:氮掺杂4H-SiC中悬臂弯曲引起的双堆垛层错的结构表征
机译:在重氮掺杂4H-SIC晶体中形成双震撼堆垛机的堆垛机,减少划痕损伤围绕伤害
机译:(11-20)高N掺杂4H-SiC的机械应力引起的双堆垛层错研究,结合光学显微镜,TEM,对比模拟和位错核重构
机译:同步X射线形貌表征4H-SiC衬底的缺陷
机译:通过室温μ-光致发光和μ-拉曼分析表征3C-SiC外延层截面中的4H和6H类堆积缺陷
机译:N掺杂的4H-SiC在脆性状态下的弯曲会产生缺陷:堆垛层错多重位错堆芯。