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Effect of annealing on magnetic properties and domain structures of FePt thin films by rapid thermal annealing technique

机译:快速热退火技术对FePt薄膜磁性能和畴结构的影响

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Single-layered FePt films of 30 nm thick were annealed at temperature between 300 and 800 ℃ for 1–180 sec by a rapid thermal annealing (RTA) with a high heating rate of 100 ℃/sec. It is found that both the grain size and magnetic domain size of the FePt film increase with increasing annealing temperature and annealing time. The FePt films exhibited soft magnetic properties and without domain images were observed by magnetic force microscope (MFM) when the films were post-annealed at below 500 ℃ for 180 sec. The in-plane coercivity (Hc//) and perpendicular coercivity (Hc⊥) of FePt film increases significantly to 7.5 and 6.5 kOe respectively as annealing temperature increases to 600 ℃. When the annealing temperature is increased to 700 ℃, they are increased to 11.1 and 9.5 kOe, respectively, and the domain structure inclines to isolated domain. However, further increasing the annealing temperature to 800 ℃, the Hc// and Hc⊥ values decrease to 9.8 and 8.9 kOe respectively due to largely increase the grain size of FePt and change the domain structure from isolation to continuity. On the other hand, in order to transform the FePt film from disordered γ phase to the ordered L10 phase, the annealing time of over 3 seconds is necessary when the film was post-annealed at 700 ℃ with a high heating rate of 100 ℃/sec by RTA technique.
机译:30纳米厚的单层FePt膜通过快速加热退火(RTA)以300℃/秒的高加热速率在300至800℃的温度下退火1–180秒。发现随着退火温度和退火时间的增加,FePt膜的晶粒尺寸和磁畴尺寸均增加。 FePt薄膜在500℃以下的温度下退火180 s后,通过磁力显微镜(MFM)观察到具有软磁性能,并且没有磁畴图像。随着退火温度升高到600℃,FePt薄膜的面内矫顽力(Hc //)和垂直矫顽力(Hc⊥)分别显着增加至7.5和6.5 kOe。当退火温度提高到700℃时,它们分别升高到11.1和9.5 kOe,并且畴结构倾向于孤立的畴。然而,进一步将退火温度提高到800℃,由于FePt的晶粒尺寸大大增加,并且畴结构从隔离变为连续,Hc //和Hc⊥值分别降至9.8和8.9 kOe。另一方面,为了使FePt薄膜从无序的γ相转变为有序的L10相,在700℃/ 100℃的高加热速率下对薄膜进行后退火时,退火时间必须超过3秒通过RTA技术。

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