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MANUFACTURE METHOD FOR ORDERED FEPT MULTILAYER THIN FILMS BY RAPID THERMAL ANNEALING

机译:快速热退火用于有序多层Feet薄膜的制造方法

摘要

A manufacturing method of a regular FePt multi-layered thin film using a rapid thermal process capable of accelerating the phase transformation of the FePt multi-layered thin film is provided to increase coercive force under the rapid thermal process after manufacturing FePt multilayer. A manufacturing method of a regular FePt multi-layered thin film using a rapid thermal process is as follows. The FePt multilayer is manufactured by using the DC sputtering(ST1). The rapid thermal processing is performed about the manufactured FePt multilayer(ST2). The FePt multi-layered thin film is manufactured by the DC magnetron sputtering apparatus. The DC sputtering performs the initial vacuum drawing 1x10-8~5x10-8 torr. The evaporation is performed after the injection of the Ar gas while maintaining the degree of vacuum with 3~10 mtorr. The thin-film substrate used during the DC sputtering performance comprises the silicon substrate.
机译:提供一种使用能够促进FePt多层薄膜的相变的快速热处理的常规FePt多层薄膜的制造方法,以在制造FePt多层之后的快速热处理下增加矫顽力。使用快速热处理的常规FePt多层薄膜的制造方法如下。 FePt多层膜通过使用直流溅射(ST1)制成。对所制造的FePt多层(ST2)进行快速热处理。 FePt多层薄膜通过DC磁控溅射设备制造。 DC溅射执行1x10-8〜5x10-8托的初始真空抽吸。注入氩气后,在保持3〜10毫托真空度的同时进行蒸发。在DC溅射性能期间使用的薄膜基板包括硅基板。

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