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Reliability Study of Silicon Carbide Schottky Diode with Fast Electron Irradiation

机译:快速电子辐照碳化硅肖特基二极管的可靠性研究

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The impact of fast electron exposure upon the performance of commercial silicon carbide Schottky diodes has been studied. Under 3 MeV electrons, absorbed dose of 10 and 15 MGy at room temperature, the forward current density-voltage characteristic of INFINEON and STMICROELECTRONICS devices have been decreased by 4.6 and 8.2 orders of magnitude respectively. The reduction is associated with the significant rise in the series resistance (INFINEON: 1.45 Ω to 121×10
机译:已经研究了快速电子暴露对商用碳化硅肖特基二极管性能的影响。在3 MeV电子下,室温下吸收剂量为10和15 MGy,INFINEON和STMICROELECTRONICS器件的正向电流密度-电压特性分别降低了4.6和8.2个数量级。减小与串联电阻的显着增加有关(INFINEON:1.45Ω至121×10

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