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Electrical characterization of 4H-SiC Schottky diodes with RuWO_x Schottky contacts before and after irradiation by fast electrons

机译:快速电子辐照前后具有RuWO_x肖特基接触的4H-SiC肖特基二极管的电学特性

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摘要

The impact of radiation damage on the device Performance of 4H-SiC Schottky barrier diodes (SBDs) with RuWO_x Schottky contacts, which were irradiated at room temperature with 9MeV electrons (absorbed dose of 50 Gy), is studied by current-voltage (Ⅰ-Ⅴ) and capacitance-voltage (C-V) methods measured in the temperature ränge of 85-400 K. We have observed the radiation-induced decrease of the Schottky barrier height (SBH) from original Φ_b= 1.13-1.06eV, increase of the ideality factor from « = 1.14 to 1.39 and the noticeable increase of the Saturation current from I_s = 7.29 to 77.31 pA and the series resistance from R_s = 2.9 to 7.9 Ωcalculated from I-V measurements at T= 300 K. As a result of electron irradiation deep energy levels originated in the structure and caused the increase of serial resistance and leakage current. The DLTS results have shown several deep energy levels, e.g., E_c - 0.637 eV pointing to radiation-induced Z_(1/2) structural defects in SiC. No degradation is observed froin the measured C-V curves. The experimental vatoe of the effective Richardson constant A~* = 50.68 A/cm~2/K~2 for the irradiated sample was calculated from the modüied Richardson plot.
机译:辐射损伤对器件性能的影响用电流-电压(Ⅰ-)研究了RuWO_x肖特基接触的4H-SiC肖特基势垒二极管(SBD)在室温下用9MeV电子(吸收剂量为50 Gy)辐照。 Ⅴ)和电容电压(CV)方法在85-400 K的温度范围内测量。我们观察到辐射引起的肖特基势垒高度(SBH)从原始Φ_b= 1.13-1.06eV减小,理想化程度增加根据T = 300 K的IV测量,计算得出的系数从«= 1.14到1.39,饱和电流从I_s = 7.29到77.31 pA明显增加,串联电阻从R_s = 2.9至7.9Ω显着增加。电压源于结构,并引起串联电阻和漏电流的增加。 DLTS结果显示了几种深能级,例如E_c-0.637 eV,表明SiC中辐射引起的Z_(1/2)结构缺陷。在测得的C-V曲线上未观察到降解。由修改后的理查森图计算出被辐照样品的有效理查森常数A〜* = 50.68 A / cm〜2 / K〜2的实验值。

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  • 来源
    《Physica status solidi》 |2012年第7期|p.1384-1389|共6页
  • 作者单位

    Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Ilkovicova 3, 812 19 Bratislava, Slovakia;

    Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Ilkovicova 3, 812 19 Bratislava, Slovakia;

    Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Ilkovicova 3, 812 19 Bratislava, Slovakia;

    Institute of Materials Science, Slovak University of Technology, Paulinska 16, 917 24 Trnava, Slovakia;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    electncal characterization; fast electron irradiation; 4H-SiC schottky diodes;

    机译:电气特性快速电子辐照4H-SiC肖特基二极管;
  • 入库时间 2022-08-18 03:12:10

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