机译:快速电子辐照前后具有RuWO_x肖特基接触的4H-SiC肖特基二极管的电学特性
Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Ilkovicova 3, 812 19 Bratislava, Slovakia;
Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Ilkovicova 3, 812 19 Bratislava, Slovakia;
Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Ilkovicova 3, 812 19 Bratislava, Slovakia;
Institute of Materials Science, Slovak University of Technology, Paulinska 16, 917 24 Trnava, Slovakia;
electncal characterization; fast electron irradiation; 4H-SiC schottky diodes;
机译:具有RuO_2和RuWO_x肖特基触点的4H-SiC肖特基二极管的电学特性
机译:高能电子辐照Ni / 4H-SiC肖特基势垒二极管的电学特性
机译:高能电子辐照对Ni / 4H-SiC肖特基二极管的肖特基势垒高度和Richardson常数的影响
机译:带有Ruo {sub} x的4h-siC二极管和快速电子照射的ruwo {sub} x肖特基接触
机译:热,应变和中子辐照对AlGaN / GaN高电子迁移率晶体管和GaN肖特基二极管中缺陷形成的影响
机译:Ni / 4H-SiC肖特基二极管辐射探测器的制造与表征其敏感面积高达4 cm2
机译:高能电子辐照Ni / 4H-siC肖特基势垒二极管的电学特性