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Growth factor of Fe-doped semi-insulating InP by LP-MOCVD

机译:LP-MOCVD法掺杂Fe的半绝缘InP的生长因子

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Abstract: The semi-insulating InP has been grown using ferrocene as a dopant source by low pressure MOCVD. Fe doped semi-insulating InP material whose resistivity is equal to 2.0 $MUL 10$+8$/ approximately ega@*cm and the breakdown field is greater than 4.0 $MUL 10$+4$/Vcm$+$MIN@1$/ has been achieved. It is found that the magnitude of resistivity increases with growing pressure enhancement under keeping TMIn, PH$-3$/, ferrocene $LB@Fe(C$- 5$/H$-5$/)$-2$/$RB flow constant at 620 degrees Celsius growth temperature. Moreover, the experimental results which resistivity varies with ferrocene mole fraction are given. It is estimated that active Fe doping efficiency, $eta@, is equal to 8.7 $MUL 10$+$MIN@4$/ at 20 mbar growth pressure and 620 degrees Celsius growth temperature by the comparison of calculated and experimental results. !11
机译:摘要:通过二茂铁作为掺杂剂源,通过低压MOCVD生长了半绝缘InP。 Fe掺杂的半绝缘InP材料,其电阻率等于2.0 $ MUL 10 $ + 8 $ /大约ega @ * cm,击穿场大于4.0 $ MUL 10 $ + 4 $ / Vcm $ + $ MIN @ 1 $ /已实现。发现在保持TMIn,PH $ -3 $ /,二茂铁$ LB @ Fe(C $ -5 $ / H $ -5 $ /)$-2 $ / $ RB的情况下,电阻率的大小随着压力的增加而增加。流量恒定在摄氏620度的生长温度。给出了电阻率随二茂铁摩尔分数变化的实验结果。通过计算和实验结果的比较,估计在20 mbar的生长压力和620摄氏度的生长温度下,有效的Fe掺杂效率$ eta @等于8.7 $ MUL 10 $ + $ MIN @ 4 $ /。 !11

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