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Non-linear characteristics of passive elements on trap-rich high-resistivity Si substrates

机译:富陷阱高电阻率Si衬底上无源元件的非线性特性

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RF losses and non-linear behavior of RF passive elements such as coplanar transmission lines and inductors are analyzed. The investigated trap-rich HR-Si wafers with a fixed oxide layer of 150 nm-thick show true effective resistivity values higher than 4 kΩ-cm up to 5 GHz and harmonic distortion levels lower than −90 dBm for a 900 MHz input with signal level of +25 dBm. High quality factor of 60 is measured for a 2 nH inductor on a trap-rich HR-Si substrate at 2.73 GHz frequency of operation. Our investigations confirm the capability of trap-rich HR-SOI wafer for the integration of passive elements for RF systems.
机译:分析了射频损耗和射频无源元件(例如共面传输线和电感器)的非线性行为。所研究的具有150 nm厚固定氧化物层的富陷阱HR-Si晶片在900 MHz输入信号下显示出的真实有效电阻率值在4 GHz时高于4kΩ-cm,谐波失真水平低于-90 dBm。电平为+25 dBm。在2.73 GHz的工作频率下,对于富陷阱的HR-Si基板上的2 nH电感器,测得的高质量因子为60。我们的研究证实了富陷阱的HR-SOI晶片具有集成射频系统无源元件的能力。

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