首页> 外文会议>European microelectronics and packaging conference exhibition >MIGRATION RELIABILITY COMPARISON OF INTERCONNECTION SUBSTRATES: POLYMER THICK FILMS SEEM BETTER THAN REGARDED?
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MIGRATION RELIABILITY COMPARISON OF INTERCONNECTION SUBSTRATES: POLYMER THICK FILMS SEEM BETTER THAN REGARDED?

机译:互连基材的迁移可靠性比较:聚合物厚膜比其更好吗?

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The production of high-density interconnections for multichip modules (MCMs) requires realizing conductor-systems withvery high resolution and high reliability. The possibilities of increasing the density are determined not only by thetechnological bases but also by those physical and chemical processes that can cause resistive shorts between adjacentmetallization stripes. One of these phenomena is the electrochemical migration, which can lead to a short circuit in thedevice and can cause catastrophic failure. Silver is well known for its inclination to form migratory shorts. It has beenproven that several other metals also show dendritic growth caused by the electrochemical migration, i.e. Cu, Pb, and Sn.The migration reliability of printed wiring boards (PWBs) as well as high-density interconnections is determined by thebehavior of these metals. Polymer thick films (PTFs) use pure silver bearing conductors and they are regarded to have notto very high reliability level, one reason of which is the silver migration problem. If a ranking should be made, they shouldbe much behind the conventional CERMET thick films and printed wiring boards. Their realistic comparison is availableonly through empirical way. In order to have a realistic comparison of the various electronic metallization compositions inconnection with the migration process, experimental procedures have been carried out with low cost silver bearing thickfilm metallization systems fired on aluminum substrates, with copper and tin-lead covered copper metallization on epoxyglassPWBs, as well with silver polymer thick-films on polyester substrate. THB tests (45oC/95%RH/10VDC) wereperformed on the samples and mean time to failure (MTTF) data were compared. Also the effect of pattern resolution wasfollowed on interdigital capacitor structures. The novelty and uniqueness of the paper is the comparison of variousinterconnection systems with the surprising result: polymer thick film approach showed better reliability behavior than itscompetitors among the low cost systems.
机译:用于多芯片模块(MCM)的高密度互连的生产需要实现具有非常高分辨率和高可靠性的导体系统。增加密度的可能性不仅取决于技术基础,还取决于可能导致相邻金属化条纹之间发生电阻性短路的物理和化学过程。这些现象之一是电化学迁移,其可能导致设备短路并导致灾难性故障。银因其倾向于形成短裤而闻名。已经证明其他几种金属也显示出由电化学迁移引起的树枝状生长,即Cu,Pb和Sn。印刷线路板(PWB)的迁移可靠性以及高密度互连取决于这些金属的行为。聚合物厚膜(PTF)使用纯银轴承导体,它们被认为具有不很高的可靠性水平,其原因之一是银迁移问题。如果要进行排名,它们应该远远落后于常规的CERMET厚膜和印刷线路板。他们的现实比较只能通过经验方法来获得。为了对迁移过程中的各种电子金属化成分进行现实的比较,已经在铝基板上烧制的低成本含银厚膜金属化系统,环氧玻璃PWB上的铜和锡铅覆盖的铜金属化进行了实验程序,以及聚酯基材上的银聚合物厚膜。在样品上进行THB测试(45oC / 95%RH / 10VDC),并比较了平均失效时间(MTTF)数据。图案分辨率的影响也跟随在叉指电容器结构上。本文的新颖性和独特性是各种互连系统的比较,其结果令人吃惊:聚合物厚膜方法在低成本系统中表现出比其竞争对手更好的可靠性。

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  • 会议地点 Friedrichshafen(DE)
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    Budapest University of Technology and Economics Department of Electronics Technology H-1521 Budapest Hungary Phone: 36-1-463-3634 Fax: 36-1-463-4118;

    Budapest University of Technology and Economics Department of Electronics Technology H-1521 Budapest Hungary Phone: 36-1-463-3634 Fax: 36-1-463-4118 E-mail: Harsanyi@ett.bme.hu;

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