首页> 外文会议>European Conference on Silicon Carbide and Related Materials(ECSCRM 2004); 20040831-0904; Bologna(IT) >Evolution of Defect and Hydrogen-Related Low Temperature Photoluminescence Spectra with Annealing for Hydrogen or Helium Implanted 6H SiC
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Evolution of Defect and Hydrogen-Related Low Temperature Photoluminescence Spectra with Annealing for Hydrogen or Helium Implanted 6H SiC

机译:注入氢或氦气的6H SiC退火过程中缺陷及与氢有关的低温光致发光光谱的演化

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摘要

A set of four lightly p-type 6H SiC boule samples was implanted with H or He and annealed in isochronal stages from 950℃ to 1500℃. Differences in the hydrogen, D_Ⅰand D_Ⅱ low temperature photoluminescence spectra are observed and compared. Surprisingly, the hydrogen spectrum appears after a 1300℃ anneal in the He implanted samples. A number of unidentified damage lines are also reported.
机译:一组四个轻p型6H SiC晶锭样品被注入H或He,并在950℃至1500℃的等时阶段退火。观察并比较了氢,D_Ⅰ和D_Ⅱ低温光致发光光谱的差异。出人意料的是,He注入的样品在1300℃退火后出现了氢谱。还报告了许多不确定的损坏线。

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