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Microscopic Photoluminescence Mapping of Si-Doped GaAs around Dislocations at Low Temperatures

机译:低温下位错周围硅掺杂砷化镓的微观光致发光映射

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Microscopic intensity variations of photoluminescence(PL) bands around dislocations were studied on Si-doped, liquid-encapsulated vertical boat grown GaAs at low temperatures. We measured the PL mappings for four emission bands: the 1.49eV band of frce-to-acceptor and donor-acceptor transitions involving Si_(As), the 1.33eV band associated with B_(As), the 1.15eV band due to V_(Ga) complex, and the 0.95eV band which appears commonly in n-type GaAs but has not yet been identified definitely. The PL intensity patterns of each emission band are explained based on the concept that defects have been gettered by the dislocations and that the area near the dislocations is more As-rich than that farther away.
机译:在低温下,在掺Si,液体封装的垂直舟生长GaAs上研究了位错周围光致发光(PL)带的微观强度变化。我们测量了四个发射带的PL映射:涉及Si_(As)的frce到受体和供体-受体跃迁的1.49eV带,与B_(As)相关的1.33eV带,由于V_(1.15eV)形成的1.15eV带。 Ga)复合物,以及通常在n型GaAs中出现但尚未确定的0.95eV谱带。基于位错已经吸收了缺陷并且位错附近的区域比远处的区域更富As的概念来解释每个发射带的PL强度模式。

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